Interfacial contribution to thickness dependent in-plane anisotropic magnetoresistance

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Tokaç, M., Wang, M., Jaiswal, Shashank, Rushforth, A.W., Gallagher, B.L., Atkinson, D. and Hindmarch, A.T. (2015) Interfacial contribution to thickness dependent in-plane anisotropic magnetoresistance. AIP Advances, 5 . 127108/1-127108/7. ISSN 2158-3226

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Official URL: http://scitation.aip.org/content/aip/journal/adva/5/12/10.1063/1.4937556

Abstract

We have studied in-plane anisotropic magnetoresistance (AMR) in cobalt films with overlayers having designed electrically interface transparency. With an electrically opaque cobalt/overlayer interface, the AMR ratio is shown to vary in inverse proportion to the cobalt film thickness; an indication that in-plane AMR is a consequence of anisotropic scattering with both volume and interfacial contributions. The interface scattering anisotropy opposes the volume scattering contribution, causing the AMR ratio to diminish as the cobalt film thickness is reduced. An intrinsic interface effect explains the significantly reduced AMR ratio in ultra-thin films.

Item Type:	Article
RIS ID:	https://nottingham-repository.worktribe.com/output/770181
Schools/Departments:	University of Nottingham, UK > Faculty of Science > School of Physics and Astronomy
Identification Number:	https://doi.org/10.1063/1.4937556
Depositing User:	Rushforth, Andrew
Date Deposited:	22 Sep 2016 13:22
Last Modified:	04 May 2020 17:28
URI:	https://eprints.nottingham.ac.uk/id/eprint/37055

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